概述

The Dimension® AFP is the world’s only fab-based metrology tool specifically designed for both CMP profiling and etch depth metrology for current and advanced technology nodes. The system combines the superb resolution of an AFM with the long-scan capability of an atomic force profiler to monitor etch depth and dishing and erosion on submicron features with unsurpassed repeatability. Replacing costly wafer cross-sectioning, the Dimension AFP offers the highest performance available for device characterization.