EBARA

A150W-T

A150W-M

A10S

150 X 40

AA40W

A70W

A30W

The Ebara FREX 300 S is a 300mm CMP system, featuring a four-head, four-platen design with a three-step clean process. It reliably meets 7nm tech requirements, providing development and production flexibility, and best-in-class reliability and cost of ownership.

F-REX300S

AA70W

A70WN	

This 300mm CPM system uses EBARA’s Dry-In/ Dry-Out processing and two-head/ two platen design for maximum operation flexibility. Features include 3-step cleaning, 4 FOUP loading ports, and buff stations.

F-REX300

AA200W

AAE40WN

AA200WN

80 X 25

EBARA FREX 200 is a CMP system which is used for wafer grinding, lapping, and polishing. The FREX 200 is compatible with 200mm wafer size.

F-REX200

EPO 112

AA20

40 X 20

EAC300BI-T

AA10N	

A300W	

Vacuum Dry Pump AA20N-H, 200V, 50/60 Hz, Corrosian Resist, Horizontal Outlet, with Exhaust Pressure Sensor

AA20N-H

AA30

AA20N

150X40 UERP6M

EPO 113

AA10

GDC 250 SA

ET600H-US

GDS500SA	

50 X 20

EPO 2228

AA40WN

Dry (oil free) vacuum pumps
Pumping Speed (60 Hz): 20,000 l/min

EST200WN

ESA70W

EPO 223

ESR80WN

AA70WN

GDS250SA

AAS200WN

Technical Characteristics:
-DC Motor
-Low Energy consumption
-Complete pump safeguard system
-High pump operating temperature preventing condensation
-Low noise and low vibration

AAL10

EBARA's CMP system Model F-REX is Chemical Mechanical Polishing system that enables nanometer level planarity (10~20nm on 300mm wafer) in semiconductor manufacturing process. Ebara's CMP system, Model F-REX200M2 and F-REX300X has achieved both an advanced
process performance and high productivity. This is made possible with "1-head per 1-table" unique architecture processing an individual wafer delicately while the "4 table platform" enables high throughput.

F-REX300X

AA100W

EAC300bi-hv

305W

AA70W-H

The F-REX300S2 and F-REX300X3SC offers a four head, four platen with three step clean design allowing for customized process recipes with the demonstrated capability to reliably meet 7nm technology requirements. 

F-REX300SII

A25S

AAS300WN

Vacuum Dry Pump AA20-H, 200V, 50/60 Hz, Horizontal Outlet

AA20-H

ET-600	

ESR20N

AA40WV1-H

EPO 222

ET-300W	

Pumping Speed: 1670 L/min
Ultimate Pressure: 5.0Pa

EV-S20P

150X40 UERP6M-U

EST100WN

150X40UERP6M-J

ESA25-D

EPO 222T

UERR6M 50X20 

UFP 300A

ESR201W

Dry (oil free) vacuum pumps 
Pumping Speed (60 Hz): 30,000 l/min

EST300WN

ET1600WS

A07V

Pumping speed (N2) l/min. 7000
Pumping speed (N2) m3/h 420
Ultimate pressure mbar 2x10-3
Ultimate pressure Pa 0.2
Water Consumption l/min 3.5-8
Nitrogen Consumption SLM 11-13
Nitrogen Consumption Pa m3/sec 19-22
Voltages ranges V 200-220/380-415
Motor power, installed kW 7.5
Weight, approx. kg 280
Sizes (LxWxH) mm 830x400x800
Inlet flange size DN 50 KF
Outlet flange size DN 40 KF

AAS70WN

A30W N

EST100WNHT	

ESR100WN

EPO 222A

50X20UERR6M

Pumping Speed: 1670 L/min
Ultimate Pressure: 5.0 Pa

EV-S20N

AA70WN-H

ESDP 30	

EPO-222D

EMT2400MBWC	

ESR200WN

Dry (oil free) vacuum pumps
Pumping Speed (60 Hz): 30,000 l/min

EST500WN

CS-22

UFP 200/300A

GDC250A

Vacuum Dry Pump A07V-B, 200V, 50/60 Hz, Basic Version

A07V-B

AAS100WN

A150W

**PARTS**

The Model EV-M302N dry vacuum pumps are designed for high-load applications where large volumes of reaction byproducts are generated. Its outstanding power consumption performance and enhanced corrosion resistance, as a standard, support a broad range of industry applications.           

Options:
-Various Booster & Exhaust Thermal Configurations (Process Dependent)
-ESD Resistance
-Idle Mode (Green Energy Mode)
-Hardware: Seismic Brackets
-Pump Systems – Integrated Rack Solutions
-Pump Installation Lifts
-Reusable Shipping Crates

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

EBARA

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