Novellus acquired SpeedFam-IPEC in December of 2002, a global supplier of CMP systems used in the fabrication of advanced copper interconnects.

MOMENTUM is a high-throughput, dry-in/dry-out CMP system for all 200mm-wafer process applications. Designed with extendibility to accommodate future reductions in line widths, the MOMENTUM has four independent wafer-polishing platens that allow for maximum manufacturing flexibility. It also employs a patented orbital polishing motion that minimizes surface dishing and erosion and a slurry delivery system that results in more efficient consumption of polishing chemicals.

NOVELLUS / SpeedFam-IPEC

MOMENTUM

967864

The SpeedFam AvantGaard 776 is an orbital, high-throughput chemical mechanical planarization (CMP) system designed for semiconductor wafer processing.

AvantGaard 776

The XCEDA copper CMP system is an advanced 300-mm platform designed to exceed both the technical and economic requirements of CMP at 65 nm and beyond. The XCEDA’s four polishing modules and through-the-pad slurry delivery system can reduce slurry usage by up to 40%, dramatically reducing cost-of-ownership. The XCEDA system has also demonstrated quality planarization results on porous ultra low-k (ULK) materials with k-values of less than 2.0.

XCEDA

MOMENTUM 300 is a highly flexible, dry-in/dry-out CMP system that provides a transition for manufacturers moving from 200mm to 300mm wafer processing. The system is unique in that it combines a number of advanced.

NOVELLUS / SpeedFam-IPEC

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MOMENTUM

967864

AvantGaard 776

XCEDA

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