概述

The FusionGemini Plasma Asher ES (Enhanced Strip) is a device designed for advanced IC manufacturing. It eliminates the need for “wet” chemical processing to remove post-strip residues, providing a “dry” solution through the use of specialized gas chemistries. This results in dry strip processes that only require a follow-on DI water rinse. The FusionGemini ES can perform resist strip and residue removal in the same chamber, providing high throughput and rapid parallel processing. It also provides the lowest damage of any residue removal-capable plasma asher in the industry, and uses radiant heating for multi-temperature stripping. The FusionGemini ES uses O2, H2:N2, CF4, and custom gases, and is a 200mm photoresist strip system.