概述

The plasma systems GIGAbatch 360M and 380M designed for the needs of small production runs with low requirements. The 360 version has a process chamber with a diameter of 245 mm and can hold up to 50 wafers with a diameter of 150 mm. In the 380 system, the chamber has an inner diameter of 300 mm and therefore provides space for 25 wafers with a diameter of 200 mm. The basic version is a floor-mounted device with painted paneling, adjustable feet, and casters. It has a generator with an output of 1000 W, two MFC gas ducts, temperature monitoring for the wafers, and an endpoint detection system. In addition, a device to hold the wafers and substrates is included. It is mounted inside on the chamber door and designed in line with the respective customer requirements.