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说明
Includes as standard: Apollo III reactor radially designed plenum Genmark 3-Axis pick and place robot System controller (includes Pentium computer and touch screen interface) Inductively coupled plasma source with 1250 watt 13.56 MHz RF generator One each mass flow controller (O2) (Expansion available to three total MFC's) Temperature control of bottom electrode from 50C to 250C Automatic pressure control Optical endpoint detection system Additional monitor and VGA port 60 cfm non-corrosive dry pump; Ebara S20P Emergency Off and AC distribution Installation for maintenance and operator 12 Month service warranty (includes parts and labor) Options: Recirculating temperature controller (SMC HRS012-AN-20) Custom end effector (heated with custom vacuum configuration) Additional Optical endpoint detection system for O2 plasma process and installation Integration of RS-232 Barcode Scanner to system computer ICP Matching Network presets Software Version: Apollo_2.51_Bld3 Note: Wafer Size Configured To: 100 mm; Wafer Size Capacity: 300 mm配置
Voltage: 220 VOLTS Frequency: 60 HERTZ Phase: 3 Current: 15 AMPS Dimensions: Standard- 95 x 22 x 62 IN - 570 LBS Metric- 2413.00 x 558.80 x 1574.80 mm - 258.55 kg Software version: Apollo_2.51_Bld3 Wafer Size Configured To: 100 mm; Wafer Size Capacity: 300 mm Hardware Configuration Information: Main system: Process chambers (Qty and status): 1 Handling system: Genmark robot Other Hardware Configuration: 1250W 13.56MHz ICP Matching Network, Bottom electrode Temp control, range 50C-250C, Automatic pressure control Options included: Heated end effector System condition/ last used: Last used 4/5/18 Known Faulty parts / Major missing Components (if none please specify): None- Idled as working tool SMIF System /Load ports: No Upgrades/ Special features: N/A Facilities: Supply Voltage, sub fab items 220V, 15A, 3P Support Equipment: -Pumps sold with: 1 Ebara S20P -Chillers sold with: 1 SMC HRS012-AN-20 Used for (please list metals or chemicals used in processing): Oxygen etchant used for organic material removal.OEM 型号描述
未提供文件
无文件
类别
Ashers / Plasma Cleaner
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
127374
晶圆尺寸：
4"/100mm
年份：
2016
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TRION
APOLLO III
类别
Ashers / Plasma Cleaner
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
127374
晶圆尺寸：
4"/100mm
年份：
2016
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Includes as standard: Apollo III reactor radially designed plenum Genmark 3-Axis pick and place robot System controller (includes Pentium computer and touch screen interface) Inductively coupled plasma source with 1250 watt 13.56 MHz RF generator One each mass flow controller (O2) (Expansion available to three total MFC's) Temperature control of bottom electrode from 50C to 250C Automatic pressure control Optical endpoint detection system Additional monitor and VGA port 60 cfm non-corrosive dry pump; Ebara S20P Emergency Off and AC distribution Installation for maintenance and operator 12 Month service warranty (includes parts and labor) Options: Recirculating temperature controller (SMC HRS012-AN-20) Custom end effector (heated with custom vacuum configuration) Additional Optical endpoint detection system for O2 plasma process and installation Integration of RS-232 Barcode Scanner to system computer ICP Matching Network presets Software Version: Apollo_2.51_Bld3 Note: Wafer Size Configured To: 100 mm; Wafer Size Capacity: 300 mm配置
Voltage: 220 VOLTS Frequency: 60 HERTZ Phase: 3 Current: 15 AMPS Dimensions: Standard- 95 x 22 x 62 IN - 570 LBS Metric- 2413.00 x 558.80 x 1574.80 mm - 258.55 kg Software version: Apollo_2.51_Bld3 Wafer Size Configured To: 100 mm; Wafer Size Capacity: 300 mm Hardware Configuration Information: Main system: Process chambers (Qty and status): 1 Handling system: Genmark robot Other Hardware Configuration: 1250W 13.56MHz ICP Matching Network, Bottom electrode Temp control, range 50C-250C, Automatic pressure control Options included: Heated end effector System condition/ last used: Last used 4/5/18 Known Faulty parts / Major missing Components (if none please specify): None- Idled as working tool SMIF System /Load ports: No Upgrades/ Special features: N/A Facilities: Supply Voltage, sub fab items 220V, 15A, 3P Support Equipment: -Pumps sold with: 1 Ebara S20P -Chillers sold with: 1 SMC HRS012-AN-20 Used for (please list metals or chemicals used in processing): Oxygen etchant used for organic material removal.OEM 型号描述
未提供文件
无文件