Novellus acquired Gasonics in 2001. Novellus now offers a suite of advanced photoresist strip and clean products. 

The Aura 1000 is an advanced dry chemistry processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed to be used in the fabrication of ICs with feature sizes of 0.25 microns and below. The system provides a lower cost of ownership solution for advanced IC manufacturers and has a throughput rate ranging from approximately 45 to 55 wafers per hour, depending on wafer size and customer application.

LAM RESEARCH / NOVELLUS / GASONICS 

A1000 

PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.

L3510

A2000

The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.

PEP IRIDIA

Gasonics/IPC: Aura 3000, downstream rrucrowave asher, 60 wafers per hour, 8-inch capable.

A3000

PEP 4800DL

The Aura 3010 is an enhancement to the Aura 3000.

A3010

PEP 3510A

L3200

L3500

PEP IRIDIA DL

L2200

PEP 3510C is a dry chemistry downstream processing system manufactured by GaSonics. It is designed for photoresist removal in the fabrication of ICs with feature sizes of 0.25 microns and below. The system incorporates the Company’s proprietary microwave downstream processing technology and has a throughput rate ranging from approximately 45 to 55 wafers per hour, depending upon wafer size and customer application.

PEP 3510C

L3300

The PEP 3510Plus is a sophisticated system designed for the damage-free removal of photoresist. It is a dual chamber microwave downstream photoresist removal system that uses a combination of platen and lamp wafer heating to achieve high strip rates, resulting in high throughput. This production-proven system is commonly used for bulk photoresist removal and descum applications. Its advanced technology ensures efficient and effective photoresist removal.

LAM RESEARCH / NOVELLUS / GASONICS

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A1000

L3510

A2000

PEP IRIDIA

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