The Karl Suss BA 6 mask aligner can be used for processing of wafers from 2" to 150mm. The Karl Suss BA 6 is designed for all standard lithography applications and wafer sized up to 150mm. The Karl Suss BA 6 also offers high resolution and optimum edge quality for thick-resist MEMs applications, and features tailored to III-V compounds, thin or warped wafers, tranparent substrates, or single dies.

SUSS MicroTec offers a wide product portfolio of high quality process solutions for the semiconductor industry and related markets. SUSS portfolio covers a comprehensive range of products and solutions for backend lithography, wafer bonding, and photomask processing, complemented by micro-optical components. 

BA6

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