说明
SEM - Critical Dimension (CD) Measurement配置
无配置OEM 型号描述
The Applied VeritySEM 4i+ metrology system uses proprietary SEM imaging technology to enable precise control of the lithography and etching processes, measuring CDs at a precision of less than 0.3nm. Applied’s OPC Check software for the VeritySEM system performs automated qualification of OPC-based (optical proximity correction) chip designs, significantly reducing mask verification time over conventional manual methods.文件
无文件
类别
CD-SEM
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
113696
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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APPLIED MATERIALS (AMAT)
VeritySEM 4i+
类别
CD-SEM
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
113696
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
SEM - Critical Dimension (CD) Measurement配置
无配置OEM 型号描述
The Applied VeritySEM 4i+ metrology system uses proprietary SEM imaging technology to enable precise control of the lithography and etching processes, measuring CDs at a precision of less than 0.3nm. Applied’s OPC Check software for the VeritySEM system performs automated qualification of OPC-based (optical proximity correction) chip designs, significantly reducing mask verification time over conventional manual methods.文件
无文件