概述

The 7830Si CD-SEM (Critical Dimension Scanning Electron Microscope) is a system that provides fully automated measurement of critical dimensions in wafer fabrication. It combines production-proven automation and advanced metrology with new imaging technology to allow accurate and repeatable measurement for process geometries down to 0.18µm design rules. The 7830Si has a new high aspect ratio (HAR) detector for high-resolution imaging of the bottom of deep contact holes or other features. Additionally, the 7830Si includes advanced features such as automatic defect review and engineering modes for process verification. This makes it a powerful tool for ensuring the accuracy and precision of wafer fabrication processes.