说明
Single Block 2C2DIIFB Right to Left Flow配置
Photo Resist Coat and Develop SystemOEM 型号描述
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文件
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TEL / TOKYO ELECTRON
MARK 7
已验证
类别
Coaters & Developers
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
59254
晶圆尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部TEL / TOKYO ELECTRON
MARK 7
已验证
类别
Coaters & Developers
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
59254
晶圆尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Single Block 2C2DIIFB Right to Left Flow配置
Photo Resist Coat and Develop SystemOEM 型号描述
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文件
无文件