说明
Coater配置
无配置OEM 型号描述
The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.文件
无文件
TEL / TOKYO ELECTRON
ACT M
已验证
类别
Coaters & Developers
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
31268
晶圆尺寸：
未知
年份：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
ACT M
已验证
类别
Coaters & Developers
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
31268
晶圆尺寸：
未知
年份：
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Coater配置
无配置OEM 型号描述
The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.文件
无文件