说明
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 3D, 1WEE, 11LHP, 4CPL, 1CPL-t, 1TRS, 2TRS-L Mainframe: Single Block LD: 3ea, no modification配置
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 2D, 1WEE, 3LHP, 2PCH, 2CPL, 3TRS Mainframe : Single Block LD: 2ea modified to AsystOEM 型号描述
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.文件
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TEL / TOKYO ELECTRON
ACT 8
已验证
类别
Coaters & Developers
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105233
晶圆尺寸：
8"/200mm
年份：
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ACT 8
类别
Coaters & Developers
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105233
晶圆尺寸：
8"/200mm
年份：
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 3D, 1WEE, 11LHP, 4CPL, 1CPL-t, 1TRS, 2TRS-L Mainframe: Single Block LD: 3ea, no modification配置
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 2D, 1WEE, 3LHP, 2PCH, 2CPL, 3TRS Mainframe : Single Block LD: 2ea modified to AsystOEM 型号描述
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.文件
无文件