说明
WCVD (Chemical Vapor Deposition)配置
无配置OEM 型号描述
The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.文件
无文件
LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS MAX
已验证
类别
CVD (Metalization)
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
18404
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS MAX
已验证
类别
CVD (Metalization)
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
18404
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
WCVD (Chemical Vapor Deposition)配置
无配置OEM 型号描述
The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.文件
无文件