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APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
说明
Applied Materials standard 4-6" CVD chamber. Can be used for Teos and Nitride CVD
配置
Configured for P-5000 chamber A position Where used: 0010-10327 0226-30332 0010-76270 0100-09022 0100-09123 0100-09123 0090-09125 0040-09817 0020-34731 0200-35007 0020-26158 0190-09272 0010-09263 0100-09246 0100-00149 0100-20147 0021-39570 0021-03488 0040-21897 0240-31632 0010-09982 0010-70074 0660-01592 0021-10602 0660-01592 0150-76037 0190-40045 0100-09010 0200-35256 0010-09174 0010-35502 0100-20098 0100-20098 0100-20098 0010-02991 0100-35230 0200-35671 0020-20586 0200-35208 0200-35693 0200-35693 0200-36679 0100-00014 0020-34299 0010-00685 0021-36198 0200-01225 0100-00008 0100-09010 0010-09843 0040-39077
OEM 型号描述
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
文件

无文件

PREFERRED
 
SELLER
类别
CVD

上次验证: 30 多天前

Buyer pays 12% premium of final sale price
物品主要详细信息

状况:

Used


运行状况:

Installed / Idle


产品编号:

60923


晶圆尺寸:

4"/100mm, 6"/150mm


Chamber Processes:
CVD

年份:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PREFERRED
 
SELLER

APPLIED MATERIALS (AMAT)

P5000 CVD

verified-listing-icon
已验证
类别
CVD
上次验证: 30 多天前
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/0b96ab79d09f42e1a078d0a0980c712f_71d7309493344d358616a40514eef0541201a_mw.jpeg
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/399770369fcb4ce7a084fc5a5053d822_b273bdbb7a9f4ae083da794a52b852231201a_mw.jpeg
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/dbcc377f784845499962eae1badbb336_f784b4da46b84a96a155be2ea0849f99_mw.jpeg
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/a7c61065df2542238c97b0811e686e81_de7f51bdc3854e87a345bf6c8182d2ba1201a_mw.jpeg
Buyer pays 12% premium of final sale price
物品主要详细信息

状况:

Used


运行状况:

Installed / Idle


产品编号:

60923


晶圆尺寸:

4"/100mm, 6"/150mm


Chamber Processes:
CVD

年份:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Applied Materials standard 4-6" CVD chamber. Can be used for Teos and Nitride CVD
配置
Configured for P-5000 chamber A position Where used: 0010-10327 0226-30332 0010-76270 0100-09022 0100-09123 0100-09123 0090-09125 0040-09817 0020-34731 0200-35007 0020-26158 0190-09272 0010-09263 0100-09246 0100-00149 0100-20147 0021-39570 0021-03488 0040-21897 0240-31632 0010-09982 0010-70074 0660-01592 0021-10602 0660-01592 0150-76037 0190-40045 0100-09010 0200-35256 0010-09174 0010-35502 0100-20098 0100-20098 0100-20098 0010-02991 0100-35230 0200-35671 0020-20586 0200-35208 0200-35693 0200-35693 0200-36679 0100-00014 0020-34299 0010-00685 0021-36198 0200-01225 0100-00008 0100-09010 0010-09843 0040-39077
OEM 型号描述
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
文件

无文件

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