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APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
  • APPLIED MATERIALS (AMAT) CENTURA ULTIMA HDP-CVD
说明
Description Dimension Qty Main Frame 102×90×93 1 System Controller 46×43×86 1 ETO Rack 42×24×81 1 ETO Rack 42×24×81 1 ETO Rack 42×24×81 1 SMC Chiller 32×48×66 1 SMIF LOADER 20x20x62 1 Monitor Rack 21×22×78 1 Tote #1 (Large Pallet Tote): Misc Parts 41×49×37 1 Tote #2 (Large Pallet Tote): Misc Parts 41×49×37 1 Top Gas duct 19×14×79 1 SMIF LOADER 20x20x62 1
配置
Type of System HDPCVD Loadlock Type WideBody Robot Type HP+ Chamber A HDPCVD Chamber B HDPCVD Chamber C N/A Chamber D HDPCVD Chamber E M/SCOOL Chamber F ORINTER Controller Standard AC Rack N/A GEN RACK A/ETO GEN RACK B/ETO Gen Rack D/ETO Video Monitor Rack 2 Includes Monitor, base and light Pen Gas Panel MFC GAS/LIQ Size CH A 1/O2 gas 400 2/AR Gas 300 3/SIH4 GAS 200 4/H2 GAS 1000 5/AR GAS 50 6/SIH4 GAS 20 7/H2 GAS 100 8/NF3 GAS 2SL 9/AR GAS 2SL 10/O2$ GAS 50 CH B 11/O2 gas 400 12/AR Gas 300 13/SIH4 GAS 200 14/H2 GAS 1000 15/AR GAS 50 16/SIH4 GAS 20 17/H2 GAS 100 18/NF3 GAS 2SL 19/AR GAS 2SL 20/O2$ GAS 50 CHD 31/O2 gas 400 32/AR Gas 300 33/SIH4 GAS 200 34/H2 GAS 1000 35/AR GAS 50 36/SIH4 GAS 20 37/H2 GAS 100 38/NF3 GAS 2SL 39/AR GAS 2SL 40/O2$ GAS 50
OEM 型号描述
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.
文件
类别
CVD

上次验证: 30 天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

127828


晶圆尺寸:

8"/200mm


年份:

1999


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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APPLIED MATERIALS (AMAT)

CENTURA ULTIMA HDP-CVD

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已验证
类别
CVD
上次验证: 30 天前
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物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

127828


晶圆尺寸:

8"/200mm


年份:

1999


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Description Dimension Qty Main Frame 102×90×93 1 System Controller 46×43×86 1 ETO Rack 42×24×81 1 ETO Rack 42×24×81 1 ETO Rack 42×24×81 1 SMC Chiller 32×48×66 1 SMIF LOADER 20x20x62 1 Monitor Rack 21×22×78 1 Tote #1 (Large Pallet Tote): Misc Parts 41×49×37 1 Tote #2 (Large Pallet Tote): Misc Parts 41×49×37 1 Top Gas duct 19×14×79 1 SMIF LOADER 20x20x62 1
配置
Type of System HDPCVD Loadlock Type WideBody Robot Type HP+ Chamber A HDPCVD Chamber B HDPCVD Chamber C N/A Chamber D HDPCVD Chamber E M/SCOOL Chamber F ORINTER Controller Standard AC Rack N/A GEN RACK A/ETO GEN RACK B/ETO Gen Rack D/ETO Video Monitor Rack 2 Includes Monitor, base and light Pen Gas Panel MFC GAS/LIQ Size CH A 1/O2 gas 400 2/AR Gas 300 3/SIH4 GAS 200 4/H2 GAS 1000 5/AR GAS 50 6/SIH4 GAS 20 7/H2 GAS 100 8/NF3 GAS 2SL 9/AR GAS 2SL 10/O2$ GAS 50 CH B 11/O2 gas 400 12/AR Gas 300 13/SIH4 GAS 200 14/H2 GAS 1000 15/AR GAS 50 16/SIH4 GAS 20 17/H2 GAS 100 18/NF3 GAS 2SL 19/AR GAS 2SL 20/O2$ GAS 50 CHD 31/O2 gas 400 32/AR Gas 300 33/SIH4 GAS 200 34/H2 GAS 1000 35/AR GAS 50 36/SIH4 GAS 20 37/H2 GAS 100 38/NF3 GAS 2SL 39/AR GAS 2SL 40/O2$ GAS 50
OEM 型号描述
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.
文件
类似上架物品
查看全部