CVR-9000 SERIES
类别
CVD概述
A platform for handling wafers of diameter 5″ to diameter 8″ High-density, uniform plasma enables stable processing.
活动的上架物品
2
服务
检验、保险、评估、物流
A platform for handling wafers of diameter 5″ to diameter 8″ High-density, uniform plasma enables stable processing.
2
检验、保险、评估、物流