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市场 > CVD > LAM RESEARCH / NOVELLUS > CONCEPT THREE "C3" ALTUS MAX

CONCEPT THREE "C3" ALTUS MAX

类别
CVD
概述

The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.

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