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市场 > CVD > LAM RESEARCH / NOVELLUS > CONCEPT TWO "C2" ALTUS-S

CONCEPT TWO "C2" ALTUS-S

类别
CVD
概述

Enhanced versions of ALTUS system offer improved throughput performance for both thick and thin dielectric films, while occupying 45% less space than previous versions. It also provide a range of improved maintainability features and design enhancements that reduce customer facilities costs. It is available in both single and dual chamber version.

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