COMPASS 200
概述
Applied Compass, a patterned wafer inspection systems designed for process monitoring down to the 100nm technology node. Critical defects are detected at production worthy throughput with OMNIView™, a multi-perspective laser scanning technology ensuring robust detection of a wide variety of defect types across all process layers. Compass is a high performance production tool and has the technology required for fast introduction of new technologies to volume production.
活动的上架物品
4
服务
检验、保险、评估、物流