概述

The Complus 4T enables users to detect surface particles, pattern flaws, and other conditions that may compromise a completed device. Wafer Inspection: 6\"-12\" wafers" Efficient nuisance filtering and on-the-fly (OTF) defect grouping allow process excursion control based on defect-of-interest, accelerating defect resolution. Seamless connectivity between ComPLUS 4T and SEMVision defect review systems eases information transfer between the two, and also allows inspection recipe tuning on the review system, dramatically improving productivity of both the inspection and the review systems. Applied ComPLUS 4T Inspection is a Darkfield wafer inspection system that performs high-speed defect and process monitoring for 65nm production. Using dual-angle illumination, a proprietary enlarged GrayField technology, and advanced noise suppression techniques, ComPLUS 4T detects a broad range of defects at production throughput with 20% higher capture rate on critical defects, enabling faster ramp and higher production yield.