概述

The SEMVision G4 is part of the Applied SEMVision™ family, which is the industry’s fastest and most sensitive line of defect review and analysis tools for 65/45nm manufacturing and beyond. The new line of three systems sets the industry benchmark with 30nm sensitivity and throughputs of up to 2,400 defects per hour. The SEMVision G4 brings several advanced defect monitoring capabilities from the engineering floor to in-line volume manufacturing. These vital analytical tools enable customers to rapidly analyze and classify defects as small as 30nm in the most sensitive device layers, such as immersion photoresist and low-k dielectrics.