概述

- Defect Detection & Classification - Precision Dimensional Metrology Automatic and Manual Operation - Up to 300 mm Wafer/ Part Capacity - Top Performance Clean-Room Model This top performance system is designed for applications where high-speed defect detection and precision measurements on wafers and other parts are required. It is well suited for use as a dedicated production tool or as a versatile process development system. It features a powerful set of automated as well as semi-automatic optical/ video tools optimized for high accuracy, production throughput, and ease of use. This automated and versatile platform features a standard Nikon/ Olympus bright/ dark field microscope with optional Nomarski, and precise part staging. This system offers significant and unique advantages for dual production/ engineering use, and provides the perfect solution when both defect detection and dimensional metrology are required. The system can be configured or customized to meet your exact requirements with a variety of optical and illumination accessories, custom wafer/part fixtures, as well as custom operator interface, data formats and reports.