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KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
说明
无说明
配置
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEM 型号描述
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
文件

无文件

类别
Defect Inspection

上次验证: 60 多天前

物品主要详细信息

状况:

Refurbished


运行状况:

未知


产品编号:

101992


晶圆尺寸:

6"/150mm


年份:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

CANDELA OSA-6100

verified-listing-icon
已验证
类别
Defect Inspection
上次验证: 60 多天前
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/1c8a2b6d370b4e1e924015956d108fe7_2_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/be51dfbbef7d4b6fb5f28e4ea7efa111_1_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/485ae4d985684bc3a9bda518effa6a2f_4_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/7bf686ce73dc442696cbdb6f62d15783_spk3632_mw.jpg
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/5c44323dce4c44c79036257d84eefc90_3_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/10b7fd1f006847c59fad2da85a59a40e_spk3633_mw.jpg
物品主要详细信息

状况:

Refurbished


运行状况:

未知


产品编号:

101992


晶圆尺寸:

6"/150mm


年份:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEM 型号描述
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
文件

无文件