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201
概述
The KLA-201 Automatic Photomask Inspection Station allows you to inspect photomasks and multidie reticles for random defects today and to quickly add repeating defect inspection and single-die reticle inspection capability tomorrow. In addition, glass wafers can be inspected for both random and repeating defects.
活动的上架物品
6
服务
检验、保险、评估、物流
