说明
KLA2365 Lamp配置
11471781OEM 型号描述
The KLA / TENCOR 2365 is a high resolution imaging system that can be used in 200mm and 300mm fabs. Applications include ritical etch, critical CMP, photo, and engineering analysis. It is particularly ideal for EOL metal etch and copper CMP layers. The KLA/TENCOR 2365 prober uses UV and visible light source and 0.12-mm pixel size for improved inspection sensitivity for 65-nm node and below design rules. In 2004, KLA introduced our latest generation ultraviolet (“UV”)-based high-resolution imaging inspection system, the 2365, which incorporates multiple-bandwidth brightfield illumination and other enhancements to extend the performance of the 2xxx series to the 90-nm node and below.文件
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KLA
2365
已验证
类别
Defect Inspection
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
101317
晶圆尺寸：
8"/200mm, 12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA
2365
已验证
类别
Defect Inspection
上次验证： 18 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
101317
晶圆尺寸：
8"/200mm, 12"/300mm
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
KLA2365 Lamp配置
11471781OEM 型号描述
The KLA / TENCOR 2365 is a high resolution imaging system that can be used in 200mm and 300mm fabs. Applications include ritical etch, critical CMP, photo, and engineering analysis. It is particularly ideal for EOL metal etch and copper CMP layers. The KLA/TENCOR 2365 prober uses UV and visible light source and 0.12-mm pixel size for improved inspection sensitivity for 65-nm node and below design rules. In 2004, KLA introduced our latest generation ultraviolet (“UV”)-based high-resolution imaging inspection system, the 2365, which incorporates multiple-bandwidth brightfield illumination and other enhancements to extend the performance of the 2xxx series to the 90-nm node and below.文件
无文件
类似上架物品
查看全部无类似上架物品