概述

KLA / TENCOR Candela CS900 surface defect and EPI epitaxial defect inspection equipment is used for inspection and analysis of defects in Si silicon wafers and GaN epitaxial wafers, SiC substrates and SiC epitaxial wafers. Other applications for the Candela CS900 include EPI epitaxial defects, including particles, scratches, pits, pollution, traces, and PL function can also be added for detection some GaN EPI defects and SiC EPI defects. The device is compatible with transparent and opaque films.