The KLA-221 Automatic Reticle and Photomask Inspection System allows you to inspect photomasks, multi-die reticles, single-die reticles and glass wafers for both random and repeating defects. This versatile, high­ performance production system employs both die-to-die and die-to-database inspection technology. 

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

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