概述

The 295x Series broadband plasma defect inspection systems provide advancements in optical defect inspection, enabling discovery of yield-critical defects on ≤7nm logic and leading-edge memory design nodes. Using enhanced broadband plasma illumination technology, and the new pixel•point™ and nano•cell™ design-aware technologies, the 2950 and 2955 broadband plasma defect inspectors provide the sensitivity required to capture critical defects across a range of process layers, material types and process stacks. As the industry-standard for inline monitoring, the 295x Series pairs sensitivity with optical wafer defect inspection speed, enabling Discovery at the Speed of Light™ – the combination of fast defect discovery and full characterization of defect issues at optimal cost of ownership.