概述

The Puma 9500 Series narrowband inspection systems provide high performance excursion monitoring for the 32nm and below design nodes. It has twice the resolution and speed of previous-generation Puma laser imaging inspectors. It is part of a portfolio of advanced wafer defect inspection tools that accelerate the development and production ramp of leading-edge devices. It provides the sensitivity-at-throughput required to control critical yield excursions for a broad range of applications, including CMP, Etch, Lithography, and Films.