The Puma™ 9850 laser scanning patterned wafer inspection system utilizes a range of operating modes to support yield-relevant defect capture for lithography and etch applications and cost-effective excursion monitoring for film and CMP process modules. 

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

PUMA 9850

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