概述

Vistec’s LMS IPRO4 is a fully automated mask metrology system designed to support mask metrology requirements of the 45nm node. It can measure registration and critical dimensions in transmitted or reflected light at i-line (365nm). The system is known for its measurement performance, reliability, user-friendly interface, and comprehensive data evaluation software. It can also be equipped with an optional 300mm wafer chuck to qualify pattern placement of wafer lithography tools. Key features include I-line UV-illumination, edge detection, registration long-term repeatability, full coverage of 230mm reticles and 300mm wafers, through pellicle measurement capability, mask rotation capability, and enhanced minienvironment stability.