CENTURA METAL DPS
概述
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).
活动的上架物品
10
服务
检验、保险、评估、物流
APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 2007状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 2006状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 状况: 二手上次验证6 天前
APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 状况: 二手上次验证6 天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 2000状况: 二手上次验证30 多天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 2000状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
Dry / Plasma Etch年份: 1999状况: 二手上次验证60 多天前