CENTURA METAL DPS II
概述
For etching advanced conducting films, Applied launched DPS systems in fiscal 2001, the Metal Etch DPS™ II and Silicon Etch DPS™ II Centura systems, offering customers the technology, productivity and reliability required for 100nm and below processing.
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APPLIED MATERIALS (AMAT)
CENTURA METAL DPS II
Dry / Plasma Etch年份: 2003状况: 二手上次验证12 天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS II
Dry / Plasma Etch年份: 2005状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS II
Dry / Plasma Etch年份: 2011状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT)
CENTURA METAL DPS II
Dry / Plasma Etch年份: 2004状况: 二手上次验证60 多天前