概述

The Applied Tetra II Mask Etch system offers high-productivity processes for both chrome and dielectric mask etching. For chrome etching, the system provides exceptional critical dimension control and process uniformity for all mask technologies. Its dielectric etch capabilities enable the most advanced phase-shift masks, offering mask makers the flexibility to manufacture both resist-masked as well as chrome-masked applications at high yields. The Tetra II is the only mask etch tool that can be configured with up to four mask etch chambers for maximum productivity across all commonly used applications.