概述

The Primo HD-RIE® system is AMEC’s latest-generation dielectric etch product, launched in 2015. Based on Primo SSC AD-RIETM platform with six etch processing stations capability to maximize productivity, the tool is designed to provide comprehensive solutions for middle and high aspect ratio (HAR) structure etch. New features include: High power synchronized RF pulsing, high power and high temperature ESC, gas pulsing, multiple-zone gas distribution, cooled focus ring process kits and enhanced lid temperature control. Primo HD-RIE has superb performance in middle and high aspect ratio (HAR) etch for 3D NAND and DRAM applications. The tool has already been deployed for critical applications in mass production.