说明
CVD Chemical Vapor Deposition配置
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 型号描述
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.文件
无文件
MATTSON
ASPEN II
已验证
类别
Dry / Plasma Etch
上次验证： 30 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
66491
晶圆尺寸：
6"/150mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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MATTSON
ASPEN II
类别
Dry / Plasma Etch
上次验证： 30 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
66491
晶圆尺寸：
6"/150mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
CVD Chemical Vapor Deposition配置
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 型号描述
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.文件
无文件