概述

The SPTS Omega Rapier is a deep silicon etcher that uses an inductively coupled plasma (ICP) etching system for etching deep features in silicon. It uses a fast switching Bosch process that produces smooth sidewall profiles while etching silicon up to 30 µm per minute. The Rapier module etches Si using Bosch switched processing as well as non-switched etching for tapered profiles, wafer thinning and via reveal.