说明
无说明配置
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEM 型号描述
未提供文件
无文件
DESPATCH
LCB
已验证
类别
Oven
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
15266
晶圆尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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DESPATCH
LCB
已验证
类别
Oven
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
15266
晶圆尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEM 型号描述
未提供文件
无文件
类似上架物品
查看全部无类似上架物品