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Centura HTF EPI配置
HT Platform 2 Epitaxial / Polycide chambers (A,D) 1 Cool station Process Gas: (SiH4l SiH2CI2, TiCI4; GeH4; SiH3CH3 HCI, CH4, H2OEM 型号描述
The Centura EPI is a state-of-the-art system that offers the advantages of single-wafer, multi-chamber design for epi deposition. This advanced system provides high throughput, lower cost of ownership benefits, and advanced robotics. The Centura EPI has recently undergone productivity enhancements, including the new AccuSETT remote system for accurate stepper enhanced thickness and In-Line Metrology for integrated FTIR in the cooldown chamber. These enhancements make the Centura EPI an even more powerful tool for epi deposition.文件
无文件
类别
Epitaxial deposition (EPI)
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
121042
晶圆尺寸：
8"/200mm
年份：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA EPI
类别
Epitaxial deposition (EPI)
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
121042
晶圆尺寸：
8"/200mm
年份：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Centura HTF EPI配置
HT Platform 2 Epitaxial / Polycide chambers (A,D) 1 Cool station Process Gas: (SiH4l SiH2CI2, TiCI4; GeH4; SiH3CH3 HCI, CH4, H2OEM 型号描述
The Centura EPI is a state-of-the-art system that offers the advantages of single-wafer, multi-chamber design for epi deposition. This advanced system provides high throughput, lower cost of ownership benefits, and advanced robotics. The Centura EPI has recently undergone productivity enhancements, including the new AccuSETT remote system for accurate stepper enhanced thickness and In-Line Metrology for integrated FTIR in the cooldown chamber. These enhancements make the Centura EPI an even more powerful tool for epi deposition.文件
无文件