概述

The ASM Epsilon One is a single-wafer, lamp-heated, RTCVD (Rapid Thermal Chemical Vapor Deposition) reactor. The temperature distribution for an ASM Epsilon One CVD reactor has been simulated by commercial fluent software with the total pressure at ATM. To simplify the simulation, hydrogen is considered to be the main gas flowing over the susceptor. Additionally, Epsilon One features the industry’s highest deposition rates at low temperatures due to its optimized performance with ASM’s Silcore® precursors.