说明
manual load table. 2 chemical cabinets 4 canisters.配置
无配置OEM 型号描述
The ZETA™ 200 is a fully automated system that can transfer wafer batches from incoming SMIF pods to the process chamber in a full mini-environment, ensuring minimal added particles. The system features the unique, high-temperature ViPR™ process for high-performance and low-cost stripping of resist, silicide, and other films. Batch spray processing provides a more economical alternative to single wafer resist strip solutions. The ZETA™ 200 can be configured with up to 8 different chemical inputs to a single, closed chamber, providing the flexibility to blend chemicals or change mix ratios and temperatures within a recipe. This system is also available in 300mm as the ZETA™ 300.文件
无文件
TEL / FSI
ZETA 200
已验证
类别
Etch/Asher
上次验证: 18 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
25335
晶圆尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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TEL / FSI
ZETA 200
类别
Etch/Asher
上次验证: 18 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
25335
晶圆尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
manual load table. 2 chemical cabinets 4 canisters.配置
无配置OEM 型号描述
The ZETA™ 200 is a fully automated system that can transfer wafer batches from incoming SMIF pods to the process chamber in a full mini-environment, ensuring minimal added particles. The system features the unique, high-temperature ViPR™ process for high-performance and low-cost stripping of resist, silicide, and other films. Batch spray processing provides a more economical alternative to single wafer resist strip solutions. The ZETA™ 200 can be configured with up to 8 different chemical inputs to a single, closed chamber, providing the flexibility to blend chemicals or change mix ratios and temperatures within a recipe. This system is also available in 300mm as the ZETA™ 300.文件
无文件
类似上架物品
查看全部无类似上架物品