The NanoQuest I ion beam etching system is the ideal platform for etching single wafer substrates up to 4”.

INTLVAC

Nanoquest I

The NanoQuest I ion beam etching system is the ideal platform for etching single wafer substrates up to 4”.
With a high cooling substrate stage, the system can etch through photo resist or masks to produce patterned substrates on any material.

Technical Features:
• Housed in compact one-piece frame with integral
electronics rack to minimize lab space.
• High vacuum design principles for quick cycle
times and low ultimate pressure performance.
• UHP Gas distribution ensures stable ion source
operation.
• Stainless steel frame with integral instrument rack,
housing a touch screen LabView interface to PLC
controller.
• Completely automated;
o pump down,
o gas flow control,
o ion source operation
for repeatable and reliable etching of substrates.

Condition:Not in full working condition
Missing Components: 3 units of backing pumps (ACP15) & SIMs probe and controller


Nanoquest I

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INTLVAC

Nanoquest I

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