The Oxford Plasmalab80Plus is a compact plasma processing system that can perform high-quality plasma-enhanced chemical vapor deposition (PECVD) of materials such as SiOx, SiNx, and SiOxNy. This system is suitable for a variety of applications, including the creation of photonics structures, passivation, and hard masks. The Plasmalab80Plus has a small footprint and offers versatile etch and deposition solutions with easy open loading. It is simple to install and operate, while still delivering excellent process quality. The open load design allows for quick wafer loading and unloading, making it ideal for research, prototyping, and low-volume production. The system also enables high-performance processes through optimized electrode cooling and precise substrate temperature control.

OXFORD

概述

活动的上架物品

总产品

服务

热门 OXFORD Etch/Asher

PLASMALAB 80 PLUS

OPAL

PLASMALAB 100 ICP 380

80

使用 Moov 上架，立即找到完美买家。

全部 OXFORD Etch/Asher