说明
无说明配置
Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)OEM 型号描述
未提供文件
无文件
KLA / SPTS
MPX ICP PRO
已验证
类别
Etch/Asher
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
24522
晶圆尺寸：
8"/200mm
年份：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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KLA / SPTS
MPX ICP PRO
类别
Etch/Asher
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
24522
晶圆尺寸：
8"/200mm
年份：
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)OEM 型号描述
未提供文件
无文件
类似上架物品
查看全部无类似上架物品