概述

EcoClean is a high throughput, low-cost of ownership, single-wafer photoresist removal system designed by Yield Engineering Systems (YES). The system uses an ICP remote source to generate atomic oxygen, which chemically reacts with the photoresist on the wafer surface. By employing a downstream resist strip process, EcoClean achieves a high removal rate without causing any electrical damage or defects to the substrates and devices. Additionally, EcoClean offers automated processing with low gas usage and is an eco-friendly “green” solution. This makes it an ideal choice for those looking for an efficient and environmentally responsible way to remove photoresist from wafers.