概述

Certas WING™ is the 2nd generation plasma-free gas chemical etch system from Tokyo Electron targeted at selective oxide film etching. Productivity of the new tool has been improved with twice the throughput while maintaining the same footprint. The Certas WING™ process capability has been expanded to achieve higher etch volumes and provide flexibility for etching of a wider variety of silicon based films that will be used in future semiconductor device manufacturing.