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TEL / TOKYO ELECTRON UNITY IIE 855SS
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, which also includes the M and Me models, each designed for specific applications to achieve higher productivity and reliability. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM™ chambers, and is available in 84, 85 and 88 models. The system boasts high throughput, a compact design, lower CoO, and ease of maintenance. The Me model also includes a Flow Control System. With its advanced features and capabilities, the UNITY® IIe is a powerful tool for achieving optimal process results.
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    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    verified-listing-icon

    已验证

    类别

    Plasma Etch
    上次验证: 60 多天前
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    26201


    晶圆尺寸:

    8"/200mm


    年份:

    未知

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    Transaction Insured by Moov
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    类似上架物品
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    TEL / TOKYO ELECTRON UNITY IIE 855SS
    TEL / TOKYO ELECTRONUNITY IIE 855SSPlasma Etch
    年份: 0状况: 二手
    上次验证19 天前

    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    verified-listing-icon

    已验证

    类别

    Plasma Etch
    上次验证: 60 多天前
    listing-photo-f943f83c88e84a64a7d2a9f751f69003-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    26201


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, which also includes the M and Me models, each designed for specific applications to achieve higher productivity and reliability. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM™ chambers, and is available in 84, 85 and 88 models. The system boasts high throughput, a compact design, lower CoO, and ease of maintenance. The Me model also includes a Flow Control System. With its advanced features and capabilities, the UNITY® IIe is a powerful tool for achieving optimal process results.
    文件

    无文件

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    查看全部
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