The TWINSCAN NXE:3600D is ASML’s latest-generation lithography system, supporting EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes. The TWINSCAN NXE:3600D combines imaging and overlay improvements with a 15% to 20% productivity improvement capability when compared to its predecessor, the NXE:3400C at dose 30mJ/cm2. The EUV lithography solutions provided by the TWINSCAN NXE:3600D are complementary to those provided by our TWINSCAN NXT systems based on ArF immersion technology.

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

TWINSCAN NXE:3600D

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