概述

This four-chamber furnace is built to process semiconductor, nano, PV, LED, and MEMS substrates up to 150 mm in diameter. Constructed from steel, Thermco’s Model 5200 Diffusion Furnace is designed to withstand operating temperatures of 200-1250°C with a cool down rate of at least 3°C per minute. The furnace is controlled by a Thermco TMX controller and its system includes one MUX computer and one control computer per tube. Each chamber accommodates process tubes up to 10 inches (251 mm) in diameter. Compatible with Model 5000LS, D1, D2, and 5000SC.